-
The Triple Ion Beam Milling System, EM TIC 3X allows production of cross sections and planar surfaces for Scanning Electron Microscopy (SEM), Microstructure Analysis (EDS, WDS, Auger, EBSD) and AFM investigations.
-
Unique ion beam milling device with two modified saddle field ion sources of variable ion energy for optimum results. It combines the preparation of TEM, SEM, and LM samples in a single benchtop unit.